Mitsuhiro Saito (MSc)


Max-Planck-Institut für Metallforschung (MPI-MF)
Heisenbergstraße 3
70569 Stuttgart

Tel. +49 (0)711/689-3530
E-mail: saito@hrem.mpi-stuttgart.mpg.de

Member of the GKIG since September 2003
Tutor: Prof. Rühle


Field of Research:
Atomistic Structure of ZnO(0001) Surface and Pd/ZnO(0001) Interface

Introduction and Aim

ZnO and Pd are used respectively for methanol synthesis that is an important catalytic activity for industrial application. It is well known that Pd particles on ZnO substrate can improve the catalytic activity [1][2]. However the mechanism is not yet known although it seems that interaction between Pd and ZnO plays an important role. Since at least growth situation of Pd seems to affect to the catalytic behavior, it is important to analyze Pd/ZnO interface which dominates growth of Pd.

Result and Discussion

The Pd/ZnO interface was produced by growing 30 nm thick epitaxial Pd overlayers on the ZnO(0001) surface. The local atomistic structure of the interface was analyzed with UHRTEM (JEM ARM-1250 at 1250kV). Prior to deposition the ZnO (0001) surface was annealed in different atmospheres and at different temperatures. The surface structure was examined by surface x-ray diffraction [3] with synchrotron radiation at ANKA (Angstrom Quelle Karlsruhe, Germany). A quantitative analysis of the crystal truncation rod (CTR) measurements (Fig. 1) revealed that the ZnO(0001) surface was unreconstructed and had steps with a height of c/2 (c: ZnO lattice constant) indicating that the oxide surface was Zn terminated.

Figure 1: Crystal truncation rod (950 °C, 1atm oxygen). Measured and simulated CTRs were compared quantitatively.

Depending on the substrate surface processing the occupancy of the topmost Zn layer was 25% (950 °C, 1 atm oxygen ), 40% (600 °C, UHV), and 75% (600 °C, 0.1 atm oxygen). We used the defect model of Kröger [4] to calculate the point defect concentration in ZnO. An increase of the Zn interstitial concentration is related to a decrease of the Zn concentration on the ZnO surface. A treatment of ZnO in an oxidizing environment (600 °C, 0.1 atm oxygen) decreases the Zn interstitial concentration resulting in a segregation of Zn to the ZnO surface. Our experimentally determined final Zn concentration of 75% agrees well with that calculated by Noguera [5]. On UHV annealed surfaces we deposit Pd at 600 °C by MBE. ARM images (Fig. 2) showed atomically flat Pd/ZnO interfaces with a largely increased Zn occupancy (Fig. 3) compared to the UHV annealed substrate 40% (Zn occupancy).

Figure 2: ARM image of the Pd/ZnO interface. The interface is atomically abrupt. The following well defined orientation relationship was extracted: Pd(111)//ZnO(0001) and Pd[110]//ZnO[11-20]


Figure 3: Simulated and experimentally recorded HRTEM images of the Pd/ZnO interface. The image simulations were performed for interfaces with different Zn occupancies, i.e. 40 % and 100 %

ELNES spectra (O-K edge) recorded in bulk ZnO and in the interface indicated Zn termination of the Pd/ZnO interface. This is consistent with first principle calculations of the Pd/ZnO interface [6]. The present results suggest that the interaction between Pd and ZnO is fairly weak and of mixed ionic and covalent character.

References

[1] H. Jacobs et al: Surface Science 160 (1985) 217-234
[2] N. Iwasa et al: Applied Catalysts A: General 125 (1995) 145-157
[3] I. K. Robinson: Phys. Rev. B33 (1986) 3830
[4] F. A. Kröger: The Chemistry of Imperfect Crystals, Vol2. North-Holland, Amsterdam (1974) 743-752
[5] C. Noguera: J. Phys. Condens. Matter 12, R367 (2000)
[6] A. Zaoui: private communication

© May 2004 GKIG